But you could use an 'egg crate" directional filter than could enable
sputtering for lift off if that is all you've got. The undercut resist is
key. Gary

Gary Hillman
S-Cubed
PO Box 365
9 Mars Ct.
Montville, NJ 07039
phone 973-263-0640 ex 35
fax 973-263-8888
Check out our web site and Twitter at www.s-cubed.com


-----Original Message-----
From: mems-talk-bounces+garyh=s-cubed.com@memsnet.org
[mailto:mems-talk-bounces+garyh=s-cubed.com@memsnet.org]On Behalf Of weiquan
yang
Sent: Monday, May 23, 2011 1:12 PM
To: General MEMS discussion
Subject: Re: [mems-talk] metal lift off problem


Hi,

You may use other way such as thermal evaporation or ebeam evaporation.
Sputtering deposition will cover the side wall of pattern, which is not good
for lift-off.

Regards

Weiquan