Hello!

Just 2 cents from me. Except deposition method consider other solvents.
Aceton may be not a good choice for lift-off, especially for resist after
plasma influence (during sputtering). It is better to choose other solvents
line NMP or DMSO. We have used DMSO with success for positive resist - it
attacks resist very aggressively.

Regards,
Ivan

> -----Original Message-----
> From: 崔林 [mailto:cuilin0512@gmail.com]
> Sent: Monday, May 23, 2011 8:32 PM
> To: MEMS-talk@memsnet.org
> Subject: [mems-talk] metal lift off problem
>
> Hi,
>
>      I am using the e-beam to pattern my sample,
> the resulotion is not very high, just around 500nm, and my
> sample is 10nm aluminum on sapphire.
>
>     It is followed by sputtering 100nm metal aluminum.
>     After that, I use the aceton to do the lift-off.
>
>     My problem is that the metal did not peel off as expected. I
> appreciate any advice.
>
>     Thank you!