TMAH @ 80C if the 200A SiO2 is pinhole free. RIE with 200A oxide mask without
photoresist.

How thick is the silicon?

regards,
Glenn

-----Original Message-----
From: Khaled Mohamed Ramadan [mailto:khaled.mohamedramadan@kaust.edu.sa]
Sent: Monday, June 06, 2011 7:13 AM
To: General MEMS discussion
Subject: Re: [mems-talk] RIE Etching SiO2/Si


Hi Judith,

If you are not concerned with the anisotropy of the etching you can try XeF2
gas etching. It is selective to SiO2 up to 500.