Hi all,

I need to etch 100 nm of borosilicate glass. I used a diluted HF + HCl
recepy - but it seems that when diluted, this doesn't create a very
smooth etch surface. However, I cannot use it in a more concentrated
form, as it has an etch rate of about 8 um/min and I need to control
the etch depth with a higher degree of precision. I need 100 nm +/- 20
nm

Any suggestions?

thanks

m