Hi

Try RIE etching.

Regards,

Peter Kuijpers
Process Engineer
Philips Innovation Services
MiPlaza/TL group
High Tech Campus 04-p5.12
5656 AE Eindhoven
The Netherlands
Phone: +31 402743667
Mobile:+31 612507027, Mobex: +31 402798904
Email: p.e.m.kuijpers@philips.com



-----Original Message-----
From: mems-talk-bounces+p.e.m.kuijpers=philips.com@memsnet.org [mailto:mems-
talk-bounces+p.e.m.kuijpers=philips.com@memsnet.org] On Behalf Of Ned Flanders
Sent: Wednesday 8 June 2011 8:14
To: General MEMS discussion
Subject: [mems-talk] Controlled, slow and smooth glass etching

Hi all,

I need to etch 100 nm of borosilicate glass. I used a diluted HF + HCl
recepy - but it seems that when diluted, this doesn't create a very
smooth etch surface. However, I cannot use it in a more concentrated
form, as it has an etch rate of about 8 um/min and I need to control
the etch depth with a higher degree of precision. I need 100 nm +/- 20
nm

Any suggestions?

thanks

m