Dear Everyone,

I am confused with this question for a long time. Does the residual stress have
a
relationship with the deposited film thickness?

I have heard that they are independent.

When I measured the residual stress of the low-stress LPCVD SiN, I found that
with the deposited SiN become thicker, the residual tensile stress is also
larger.

Has anybody had this experience?

Sincerely,
Zhijian ZHOU
Ph.D @ HKUST