Hi,
   If you have an RIE you might be able sputter/etch the Ti in a plasma of
CF4 and Hydrogen ~10%.  Consider using 200-300 mT and 300W in a parallel
plate reactor.

Good luck,
  Michael


On Tue, Jul 12, 2011 at 11:57 AM, Shane GUO  wrote:

> Hi all,
>
> I would like to use S1813 resist as an etching mask for Ti. I am wondering
> if there is anything that does not contain HF can work for me? I am thinking
> about oxalic acid or H2O2. Do they attack S1813 resist? Can they work for a
> 100nm Ti layer? Any suggestion is welcome.
>
>
> Best regards