Hi,

I do not have any experience with S1813, but i've tried to remove 5nm Ti
sticking films from Si/SiOx wafers were i needed the SiOx layer
unaffected, with H2O2. Unfortunately, H2O2 seemed to be a very slow  Ti
etchant, it seems that heating (50 degrees) helped, but my guess is an
etch rate of almost sub nm / minute. I did not properly check this with
a stepper, so I would be carefull here, also the gold layer that was on
top may have alloyed with the titanium.

Hope this helps to some degree,

Best,

Gabriel

Am 7/12/2011 5:57 PM, schrieb Shane GUO:
> Hi all,
>
> I would like to use S1813 resist as an etching mask for Ti. I am wondering if
there is anything that does not contain HF can work for me? I am thinking about
oxalic acid or H2O2. Do they attack S1813 resist? Can they work for a 100nm Ti
layer? Any suggestion is welcome.
>
>
> Best regards