Hi,

Does anybody have experience using Ma-N 440 negative resist and TMA238WA
developer? I am trying to create enclosed holes with Ma-N 440 resist, but have
to use the alternative TMA238WA rather than the designated developer from MRT.

I would like to develop 4 micron holes with 5 micron thick resist. But,  I could
not fully develop the features across the wafer. Can anybody comment on this?

Thanks a lot!

Yingtao