@ Kirt: Thanks,  is it similar like using SOG (spin-on-glass) as adhesive layer
between resist pattern and nitride ?
@ Bill: thank you very much, but I prefer common etching process

Dr. Jumril Yunas
Institute of Microengineering and Nanoelectronics (IMEN)
Universiti Kebangsaan Malaysia
43600 Bangi, Selangor - Malaysia
http://slim.ukm.my/tfolio/jumrilyunas.aspx   or
http://www..vlsi.eng.ukm.my/imen