I would just try sputtering such a thin film off in a RIE.  Use Argon at
100-50mT, 300-400W in a capacitively coupled system.

On Wed, Aug 10, 2011 at 7:07 PM, Xiaohui Lin wrote:

> Hi all: Is it possible to use any dry etch receipt to etch Cr/Au film
> (50nm)?
>
> The mask of etching is Ni.