Hi,

We usually pattern ITO using a lift-off process.
Pattern resist, deposit ITO at room temperature, lift-off ITO and anneal to
improve conductivity.

Matthieu Nannini
McGill Nanotools Microfab

>
> Date: Tue, 13 Sep 2011 21:18:40 -0500
> From: Yanhua Dai 
> Subject: [mems-talk] ITO patterning recipe
> To: mems-talk@memsnet.org
> Message-ID: <4E700F00.5060708@rice.edu>
> Content-Type: text/plain; charset=ISO-8859-1; format=flowed
>
> Hi, All
>
> Does someone know how to pattern ITO/glass? The ITO film on the glass is
> about 30nm and the pattern feature is about 20um. I tried HCL and it
> removed ITO under resist. And does someone know recipe using photoresist
> as a mask?
>
> Thank you very much!
>
> Yanhua