Hi Philips,

Thanks for your advice. Sorry for the late reply, not until 1 minute ago did
I figure out how to reply your post (I always got failed when using Chrome
browser, now everything is fine after I switched to Firefox).

Actually, I'm trying to use the PR as mask layer for silicon RIE etching.
I'm not confident how ZEP520A would survive in RIE environment or how the
selectivity might turn out to be. Have you ever tried ZEP520A for such
purpose?

Thanks,
Li

--
Li. Zhang
---------
Graduate Research Assistant
Edward P. Fitts Department of Industrial and Systems Engineering
North Carolina State University
416, 111 Lampe Dr., Daniels Hall
Raleigh, NC 27695-7906
USA
TEL: (919) 413-5459
Email: lzhang13@ncsu.edu
Web:  http://www.ise.ncsu.edu
          http://www.nnf.ncsu.edu