Yes but.  Using a simple inert plasma you can increase surface roughness but not
in the visible range.  The best explanation is treatment we do regularly when
demonstrating our hybrid plasma units.  A typical plasma would be 5 minutes of
Argon plasma.  To demonstrate the action we generally use a silicon wafer.
Shiny looks like a mirror and you can see your face in the wafer clearly.  Using
a goniometer we can measure a water contact angle of 75 degrees.  It is quite
hydrophobic, water rolls of leaving no water stain.  Checking plasma reaction.
1 minute Argon plasma gives a lower contact angle in the 50's.  2 minutes in the
30's.  3 minutes in the 20's. 4 minutes in the teens. 5 minutes as low as 2 to 3
degrees and water clings to the surface.  A roughened surface.  The wafer still
looks shiny and you can see your face clearly.  We can offer free tests if you
want to test.  Bill Moffat

-----Original Message-----
From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org [mailto:mems-
talk-bounces+bmoffat=yieldengineering.com@memsnet.org] On Behalf Of weiquan yang
Sent: Wednesday, October 12, 2011 9:23 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] How to make texturing surface for ZnSe

Hello, everyone

As we know, we can make texturing structure (pyramids) on Si by simple wet
etching. Is there anyone knowing that how to make the texturing surface for
ZnSe? Or some other ways to roughen the surface of ZnSe? The purpose is to
scatter the light and increase the light absorption.What I am thinking about is
using RIE etching or mechanical roughen. I don't know whether is possible or
not.

Regards

Weiquan Yang
Arizona State University