- piranha
- Oxygen plasma

Date: Mon, 7 Nov 2011 15:49:48 +0100
From: Judith Linacero Blanco 
Subject: [mems-talk] cleaning e-beam litography sample
To: mems-talk@memsnet.org

Hello everyone,

I made a lithography by e-beam with lines of 200nm separated 200nm with
300nm of PMMA on silicon.

Once I etch the silicon with RIE, and then I try to clean the sampleacetone,
sonicated. The problem is that I still have traces of PMMA in the sample,
and I can't clean at all the sample.

Can anyone help? How I can clean the whole sample of e-beam lithography?