Other variants are DMSO or NMP (stir or sonicate at up to 80 degrees
celsius), piranha is very aggressive and O2 plasma might not be enough.

best,

gabriel

Am 11/7/2011 3:49 PM, schrieb Judith Linacero Blanco:
> Hello everyone,
>
> I made a lithography by e-beam with lines of 200nm separated 200nm with
> 300nm of PMMA on silicon.
>
> Once I etch the silicon with RIE, and then I try to clean the sampleacetone,
> sonicated. The problem is that I still have traces of PMMA in the sample,
> and I can't clean at all the sample.
>
> Can anyone help? How I can clean the whole sample of e-beam lithography?