Hi Judith,

Have you tried a RCA cleaning? The first step, SC1, removes organic
contaminants.
Other options are using a "piranha" etch or an oxygen plasma.
Best regards,

Jorge Ramiro

Unidad Micro y Nano Fabricación/Mikro eta Nanofabrikazio Unitatea/Micro and Nano
Manufacture Unit
Tekniker-IK4



-----Mensaje original-----
De: Judith Linacero Blanco [mailto:yuyunoemi@gmail.com]
Enviado el: lunes, 07 de noviembre de 2011 15:50
Para: mems-talk@memsnet.org
Asunto: [mems-talk] cleaning e-beam litography sample

Hello everyone,

I made a lithography by e-beam with lines of 200nm separated 200nm with
300nm of PMMA on silicon.

Once I etch the silicon with RIE, and then I try to clean the sampleacetone,
sonicated. The problem is that I still have traces of PMMA in the sample,
and I can't clean at all the sample.

Can anyone help? How I can clean the whole sample of e-beam lithography?