Hi everyone,

I obtained a surface roughness of <1nm (RMS value) using for 10nm thick
aluminum film using heat evaporation process. However, as I increased the
thickness to ~200nm, the surface roughness degraded to >4.5nm. I know
sputtered aluminum film may have better surface quality, but am not sure
about the its surface roughness range for 50nm and 200nm-thick aluminum
films. Any idea is appreciated!

Thanks,
Li

--
Li. Zhang
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Graduate Research Assistant
Edward P. Fitts Department of Industrial and Systems Engineering
North Carolina State University
416, 111 Lampe Dr., Daniels Hall
Raleigh, NC 27695-7906
USA
TEL: (919) 413-5459
Email: lzhang13@ncsu.edu
Web:  http://www.ise.ncsu.edu
          http://www.nnf.ncsu.edu