Hello Everyone,

I am working on a Microchannel device, and facing some problem with AZ 4620
and SU-8 Layer. The device is fabricated on a glass substrate and I am
using AZ 4620 as sacrificial layer ( I need ~20um height). I patterned the
AZ layer using standard lithography process ( Spincoat, Bake on Hotplate
for 2mins @ 110'C, Expose and Develop using AZ 400K. ) and I want to keep
it until the last step. I than, spincoat SU-8 2025 (on top of the AZ 4620
layer), bake, expose, post bake. But when I try to develop the SU-8
structure ( using Microchem SU-8 developer ), I observe that the SU-8
structure develops alright but the AZ sacrificial layer is gone. As a
result the SU-8 structure collapse, cracks and I can't continue to the next
step.

What do you think I can do to resolve the situation ? Please suggest.

Your help is much appreciated.

Thank you.

Shib