Hello Glenn,

In principle I could deposit PECVD oxide, but for some reason our
PECVD oxide is horrid. TiN would require AC power, which we don't have
in the sputter where we have a Ti target. But I see what you are
aiming at: use a dielectric instead of a metal. I'll look into our ALD
precursors, maybe I'll find something that could work.

Thanks, I am quite optimistic I will solve this with a suitable ALD film!

m

On 1/4/12, Glenn Silveira  wrote:
> TiN is another option. Can you use a non-metallic inorganic hard mask? Any
> PECVD thin film dielectric BOE or RIE combo would work on Al.
>
> Best regards,
> Glenn