Hi all,

I have a question. I would like to etch 400nm of ITO on glass with
2.0micras of AZ as mask. Is it a good idea to etch with BL3/Cl2? I would
like to prove the process:
18BCl3 + 6Cl2 at 20mt and 200W, and I think that the etch rate is about
200nm/min

Is it a good process?

Best regards,