Hi Judith,

May be this paper in the attachment helps you. But they are using HBr
instead of BL3

By the way i am also trying to use the HCL(36%):H2O in the ratio of 1:2 to
etch the 80nm ITO. Sometime i couldnt remove the whole of ITO lying
inbetween my structures which are about 10um apart. I also have some
structures which are 80um apart which are etched in about 5mins but i am
afraid longer etching would also underetch my ITO on the long gap
structures. Do you have any experience with this wet etching? i also read
somewhere we can use liquid detergent to increase the wettability, i am not
sure if it is the normal detergent we use in kitchen?

thanks

Arun



On Mon, Jan 30, 2012 at 5:52 PM, Judith Linacero Blanco  wrote:

> Hi all,
>
> I have a question. I would like to etch 400nm of ITO on glass with
> 2.0micras of AZ as mask. Is it a good idea to etch with BL3/Cl2? I would
> like to prove the process:
> 18BCl3 + 6Cl2 at 20mt and 200W, and I think that the etch rate is about
> 200nm/min
>
> Is it a good process?
>
> Best regards