Hey Michael Martin,

I tried both. It turns out, the Ar bombardment/etching before
deposition helped the most. Still not perfect, though.

Lukasz Urbanski, I was trying to deposit a few tens of nm (up to 70,
more or less). I am not sure of the roughness of t he surface. Rougher
than a polished Si wafer, but much less rough than the unpolished side
of such wafer :D

I'll do more experiments and will let you know what worked.


On 4/12/12, Michael Martin  wrote:
> You've probably already tried this but in case you haven't: O2 plasma clean
> with lots of power to get a little sputtering too and of course pre-sputter
> the substrate in the deposition system.
>
> On Wed, Apr 11, 2012 at 4:57 AM, Ned Flanders  wrote:
>
>> Hello all,
>>
>>
>> I am trying to sputter chromium on an aluminum alloy (6061 or 7075 or
>> some such) plate. The adhesion is random and poor, no matter what I do
>> to clean the surface. I am now thinking of sputtering aluminum and
>> then chromium on top of that, and then anneal at 400C.
>>
>> Any other ideas?
>>
>>
>>
>> m
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