Hello,

I am trying to find a wet etchant for etching either Al or Cr without
etching a ZnO thin film on the same sample. I cannot let the ZnO film to be
affected in any way, hence I can't even consider solutions with some degree
of selectivity. For reasons I can't go into detail here, lift-off is not an
option. It appears that ZnO is etched in pretty much any of the acids and
bases commonly found in semiconductor processing. I'd greatly appreciate if
someone would share any insight.

Thank you,
Bhargav.
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