Alaedin yes but.  With the correct soft bake, a vacuum soft bake you can remove
the solvent from the first coat which stops intermingling of the first coat with
the second coat when you try to do a second layer of resist.  Best of luck.
Bill Moffat.

-----Original Message-----
From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org [mailto:mems-
talk-bounces+bmoffat=yieldengineering.com@memsnet.org] On Behalf Of alaa melhem
Sent: Tuesday, July 17, 2012 4:02 PM
To: General MEMS discussion
Subject: [mems-talk] Photoresist 1822

Hi Everyone,

Is it possible to coat the S 1822 positive photoresist up to 26microns??
I am looking forward to get your help.

Thank you,
Alaeddin
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