Hello everyone,

I have been trying to do a multi-layer approach to obtain a thick-film of AZ
4562 (35-40 µm) on Si but I stumbled into something rather odd.
After each coating I scratched the film to expose the Si and measured the
thickness of the film in a profile-meter. The values I obtained were:

- Coating 1: 7,86 µm
- Coating 2: 19,50 µm (∆ = 11,64 µm)
- Coating 3: 32,65 µm (∆ = 13,15 µm)
- Coating 4: 45,63 µm (∆ = 12,98 µm)

I use the same protocol for each coating: spin-coat at 500 rpm (10 s, 100 rpm/s)
+ 2000 rpm (43 s, 500 rpm/s) followed by a 5 min bake at 100 ºC.

My question is: is there any obvious reason for this variation in thickness for
each coating (e.g. why the first coating is 7,86 µm thick and the second one is
11,64 µm)? And how could I obtain uniform coating thicknesses?

Thank you in advance for your time and help.

- João Tiago
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk