pl use spin coating of opaque polymer (vary the RPM of spindle of spin
coater to optimize the thickness of the film).
Or ion beam sputter deposit any metal onto the photoresist and then
electroplate Cu on this. all are at room temperature.


On Thu, Aug 23, 2012 at 11:18 PM, Yingtao Tian  wrote:

> Hi Nabhiraj,
>
> I need some non-transparent film on photoresist to block the UV during the
> next step exposure.
>
> Thanks,
> Yingtao
>
> -----Original Message-----
> From: mems-talk-bounces+y.tian=bham.ac.uk@memsnet.org [mailto:
> mems-talk-bounces+y.tian=bham.ac.uk@memsnet.org] On Behalf Of Nabhiraj
> Yalagoud
> Sent: 23 August 2012 18:36
> To: General MEMS discussion
> Subject: Re: [mems-talk] Thin film deposition at room temperature
>
> Hello,
> What film on what substrate you want?
> Nabhiraj
>
> On Thu, Aug 23, 2012 at 8:41 PM, Yingtao Tian  wrote:
>
> > Hi All,
> >
> > I am trying to get round of how to put a thin film down at room
> > temperature. I need a localised thin film with following properties:
> >
> > 1. non-transparent
> > 2. as thin as possible - say in the order of few microns 3. easy to
> > remove 4. can be applied at around room temperature
> >
> > I am thinking of some possible spray, but have not got any clue. I
> > would appreciate if you have some  interesting idea about it.
> >
> >
> > Thanks a lot.
> >
> > Regards,
> > Yingtao
> > _______________________________________________
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