Hi,

I need 2 micron high dielectric pillars with somewhat sloped sidewalls for a
project involving post deposition, lateral dimensions are 6 by 8 microns.
I'm currently using PECVD silicon oxide, which gives good slopes, but due to
the conformal nature of the deposition, also flags (see SEM image), even
with an undercut of more than 5 microns.
Does anyone have an alternative suggestion? Or a way of getting rid of the
flags/making the PECVD more directional? Unfortunately, a post deposition
wet-etching does not really work, 10 s in 20:1 BHF already removes the
entire structure. The oxide quality is low as the PECVD is running at a low
temp (120 deg) process to avoid resist melting/glass transition.
Thanks for your input,
Gabriel

**************************************************************
Gabriel Puebla-Hellmann
ETH Zuerich
Laboratory for Solid State Physics
Quantum Device Lab
HPF D5
Schafmattstr.  16
8093 Zurich
Switzerland

Tel: +41 44 633 71 24

www.qudev.ethz.ch
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