Dr. Wang,

Appreciate your response. A quick question on whether you have attempted to
etch down to 200um. I had difficulty even with thermal grease. There seems
to be local heating effects that cause the photoresist to be eaten away
completely.
Could you give me more information on which photoresist you used and how
this was applied on the backside of the wafer.


Shree



On Tue, Dec 11, 2012 at 9:49 AM, Fei Wang  wrote:

> Hi, Shree,
>
> Why not just use the photoresist? It works well for me.
>
> Best regards,
> Fei
>
> 2012/12/5 Shree Narayanan :
> > Hello all,
> >
> > I need to mount a 4" silicon wafer on a 6" metallized carrier wafer, in
> > order to etch it in a Alcatel deep-reactive ion etcher. I am wondering if
> > someone has used thermal vacuum grease for this purpose that can be
> removed
> > easily at the end. The silicon wafer is patterned with photoresist and
> has
> > no other material on it.
> >
> > Thanks
> > Shree
> > _______________________________________________
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>
> --
> Best regards,
> Yours sincerely
> Fei Wang
> ______________
> Assistant Professor, Dr
> MIC - Department of Micro and Nanotechnology
> Technical University of Denmark (DTU)
> Building 344, 1st floor, Room no. 130
> DK-2800, Kgs. Lyngby
> Denmark
> Tel:  +45 4525 6311
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> Email: fei.wang@nanotech.dtu.dk
>        http://www.nanotech.dtu.dk
> _______________________________________________
> Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> provider of MEMS and Nanotechnology design and fabrication services.
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