Hello shree,
You could use cool grease for this, which is the best solution I think.
There would be other cheaper options available, but this is the best I have
seen.
Removal is very easy. You need to heat the sample above 70, and IPA could
wipe it out.
Cheers,
Sangeeth
On Dec 11, 2012 9:20 PM, "Fei Wang"  wrote:

> Hi, Shree,
>
> Why not just use the photoresist? It works well for me.
>
> Best regards,
> Fei
>
> 2012/12/5 Shree Narayanan :
> > Hello all,
> >
> > I need to mount a 4" silicon wafer on a 6" metallized carrier wafer, in
> > order to etch it in a Alcatel deep-reactive ion etcher. I am wondering if
> > someone has used thermal vacuum grease for this purpose that can be
> removed
> > easily at the end. The silicon wafer is patterned with photoresist and
> has
> > no other material on it.
> >
> > Thanks
> > Shree
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>
> --
> Best regards,
> Yours sincerely
> Fei Wang
> ______________
> Assistant Professor, Dr
> MIC - Department of Micro and Nanotechnology
> Technical University of Denmark (DTU)
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> _______________________________________________
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