durusmail: mems-talk: SU-8 2005 overexposed?
SU-8 2005 overexposed?
2013-01-17
Jocelyn Ng
2013-01-18
Andrew Sarangan
2013-01-18
Gareth Jenkins
2013-01-19
Jocelyn Ng
2013-01-19
Gareth Jenkins
2013-01-21
Brubaker Chad
2013-01-21
Jocelyn Ng
2013-01-22
Brubaker Chad
2013-02-04
Jocelyn Ng
2013-02-04
Bill Moffat
SU-8 2005 overexposed?
Gareth Jenkins
2013-01-19
Your bake parameters do not sound right. The datasheets recommend only
about 2mins softbake at 95C for this thickness and 3-4mins post exposure
bake at 95C (120C is too high).
Looking at the datasheet, I think Andrew may be correct that it is also
underexposed - 2 or three times the dose may be required. This would lead
to the profile not being straight (if the top of the structure is equal or
less than the size of the mask feature then this would confirm it).


On 19 January 2013 22:17, Jocelyn Ng  wrote:

> After post exposure bake, still no darkening, but after developing,
> darkening occurs. After seeing the profile using SEM, the profile is not
> straight. I soft bake it at 65C for about 9mins, 95C at 120C for post
> exposé bake.  Or does it require higher soft bake temperature for this
> photoresists?
> Thank you.
>
> Best Regards,
> Siew Mun
>
> Sent from my iPhone
>
> On 18 Jan, 2013, at 10:24, Gareth Jenkins  wrote:
>
> > Deep UV or heating of the wafer may also cause the problem. When does the
> > darkening occur? (Is it immediately visible after exposure or at some
> other
> > point in the process)? Do your structures look overexposed after
> > development?
> >
> >
> > On 17 January 2013 11:11, Jocelyn Ng  wrote:
> >
> >> Hello,
> >>
> >> I'm doing single layer SU8 2005, thickness ~6-7um. I use 60mJ/cm^-2 on
> >> sputtered gold surface. But somehow sometimes I notice that the edges
> of my
> >> pattern darkens, I suspect it's due to overexposed. But 60mJ is quite a
> low
> >> dose compared to the recommended one. I would appreciate any comments
> >> given. Thank you.
> >>
> >> Best Regards,
> >> Jocelyn
> >>
> >> Sent from my iPhone
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