Dear all, I am working with Gersteltec’s GM1050 and GM1070. However, I found that the process parameters suggested by the manual is not consistent, e.g. the exposure time is similar for 3 – 8 um, prebake time is very long for 15um thick resist (35min @ 95 degree). Do anyone has tested these parameters? I am frustated when I am working with the manual. Should I just followed the Microchem manual instead? Of course the spin coating process with be different, but PEB, softbake ane exposure should be similar. Thanks. Regards, Bill Chow _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk