The active component in CD-26 is TMAH and the rest of it is mostly
water. You can pick any TMAH based developer. The only difference will
be the concentration so your develop rates will change. For example,
AZ300MIF, MF-319,


On Thu, Jun 13, 2013 at 7:44 PM, Jocelyn Ng  wrote:
> Dear all,
>
> I'm currently using MF CD-26 developer as my general photoresist developer in
lithography process.
> Does anyone out there know is there any chemical that is equivalent to this
CD-26?
> Any thoughts or comments are much appreciated.
>
> Thank you.
>
> Best Regards,
> Jocelyn
>
> Sent from my iPhone
> _______________________________________________
> Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> provider of MEMS and Nanotechnology design and fabrication services.
> Visit us at http://www.mems-exchange.org
>
> Want to advertise to this community?  See http://www.memsnet.org
>
> To unsubscribe:
> http://mail.mems-exchange.org/mailman/listinfo/mems-talk
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk