Ajmurat, have you tried a slower spin speed. Also spin for a shorter time as you will continuously thin the resist over very long spins. The spin speed curve for the material stops at 15 microns but that is at 1000 rpm not 2000 rpm. Also you might try a speed as low as 750 rpm just to experiment to get the thicker film that you are looking for. Gary Gary Hillman S-Cubed PO Box 365 9 Mars Ct. Montville, NJ 07045 phone 973-263-0640 ex 35 fax 973-263-8888 Check out our web site and Twitter at www.s-cubed.com http://www.nanofab.utah.edu/svn/public/documents/Non%20SOPs/Photoresist/az_9 260_photoresist.pdf -----Original Message----- From: mems-talk-bounces+garyh=s-cubed.com@memsnet.org [mailto:mems-talk-bounces+garyh=s-cubed.com@memsnet.org]On Behalf Of Orozaliev Ajymurat Nurdinovich Sent: Thursday, October 03, 2013 3:30 AM To: mems-talk@memsnet.org Subject: [mems-talk] AZ9260 double spinning recipe Hi All, I was working on thick AZ9260 resist for using as a mask on DRIE tool. My target is to etch 450-480 um of Silicon. I have preliminary results for PR:Si selectivity, which is ~1:25. To etch 450 um of Si, I would need at least 18 um(but more the better) of AZ9260. With single coating I am getting maximum of 15 um. But when I do double spinning and expose it, the resist is turning yellowish-orange. Further, I develope it, but when I put it inside the DRIE tool, after a few cycles, the resist is forming flakes and contaminating inside the chamber. Here is my recipe: -2000 rpm - 60 s -removing edge bead with Acetone, while spinning. -Soft bake at 110 C for 90 s -2000 rpm - 60 s -Soft bake at 110 C for 240 s. -Exposure, broadband source,950 mJ/cm2. -Developer, AZ400:DI 4:1, 3-4 mins. With this recipe, I am getting ~25 um. but when I put it inside DRIE,the resist is just peeling of and forming flakes. Can you please advise if there is something I am missing? Also, any recipe would be much appreciated. kind regards, Ajymurat _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk ----- No virus found in this message. Checked by AVG - www.avg.com Version: 2013.0.3408 / Virus Database: 3222/6719 - Release Date: 10/03/13 _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk