durusmail: mems-talk: Resist Development dependence on Substrate Coat
Resist Development dependence on Substrate Coat
2013-10-17
2013-10-18
Resist Development dependence on Substrate Coat
shay kaplan
2013-10-18
Much of the exposure energy comes from surface reflections. If the copper
has a much higher reflection than the NiFe at the relevant wavelengths
(usually 365 -435nm) you will see this.

Shay

-----Original Message-----
From: mems-talk-bounces+shay=mizur.com@memsnet.org
[mailto:mems-talk-bounces+shay=mizur.com@memsnet.org] On Behalf Of Ricky
Anthony
Sent: Thursday, October 17, 2013 8:11 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Resist Development dependence on Substrate Coat

Hi All,

I have recently trying to develop a resist for equal thickness on two
different substrates (NIfE AND Cu coated). Even though the same process has
been used for both, the development time for NiFe is two times higher than
that with Cu. Any reasons?

Many Thanks,

Ricky Anthony
Phd Student

Microsystems Center
Tyndall National Institute
University College Cork
Cork, IRELAND

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