Hello all! I am using PDMS to protect one side of the wafer during 8 hour KOH etch at 85C. I am using Sylgard 170. I am having problems having a clean surface after wet-etching of PDMS. I am using Dynasolve 217, but its not dissolving it completely (even after hours of dipping in solution). I am even using Q-tip sometimes to remove PDMS in the Dynasolve solution. There is always this white residue/layer left. 1. Am I missing something? Is there a better way to wet etch PDMS? How about TBAF and NMP mixture? Is this more efficient than Dynasolve to remove the residual PDMS? 2. Is there an inexpensive and quick way to protect the other side of the wafer? (Other than protek and parylene coating. I am looking for something which is easy to coat and easy to remove). How about Apezion W wax? Is it stable at 85C? How do you apply solid wax to the whole wafer? (There is LPCVD silicon nitride film on the other-side but there are always some pinholes and defects and it cant stand 8 hour etch.) I would really appreciate the inputs. Thanks Abhinav Jain _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk