Second method. Lift off takes longer time.

On Friday, January 24, 2014, 김덕수  wrote:

> Hi.
>
> at first, I want you to understand that I don't know english very well.
>
>
> I want to form center holes on Ni membrane.
> 
> diameter of membrane is 3~400um(thickness 2um) and of center hole is
> 2~30um.
> 
> I want to form 5 center holes.
>
> So I thought two methods.
>
>
> 1. Using lift-off process, center holes is formed without etching process.
> 2. after deposition Ni thin film,  etching process is progressed for
> forming center holes.
>
>
> I want to know which is more efficient.
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