Hi Bill
His problem is most likely underbaking. SU8 process recommendations are
specific.  Hot plate is recommended, not kiln. If what he means by kiln is an
oven, he is probably forming a skin and trapping solvents and not baking enough
to get them out.

As far as an adhesion promoter that he probably doesn't need, APTES or GOPS
would do. It's epoxy resist, so either epoxy to meld our amine to bind....
Janis input from Ken Sautter our senior Process Engineer.  Additional thoughts,
adhesion to ITO has always been difficult. I quote Grant Wilson a true resist
guru, "we have always had problems with adhesion to ITO".  This has been solved
partially by treatment with OCTS and totally with treatment with vapor OCTS.
This is unfortunately with standard positive resist. It may need APTES or GOPS
for adhesion to SU8.  Bill Moffat

-----Original Message-----
From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org [mailto:mems-
talk-bounces+bmoffat=yieldengineering.com@memsnet.org] On Behalf Of Janis
Klavins
Sent: Monday, March 10, 2014 7:51 AM
To: General MEMS discussion
Subject: [mems-talk] SU8 adhesion problems

Hello everybody,

I am trying to coat an SU8 material on ITO etched glass. I have a problem that
during development the SU8 lifts off the glass very easily.
if the glass sheet is immersed in the developer the SU8 lifts off and floats
away.

I believe that this is a baking problem (too much or not enough) after coating
the SU8. I am using a two step kiln 65 degrees ( 1 min)  and 95 degrees (4 min).
The same settings for post exposure bake.

Has anyone seen a problem like this?

--
Best regards,
Mr. Janis Klavins
EuroLCDs
Phone: +37163600300
Mobile: +37126141049

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