Hi, I do not have a particular experience on Protek B3 but I can tell you that CF4/O2 plasma will definitely give damage to silicon nitride layer as well. Best, Kagan On 23.04.2014 20:32, Haider, Ahmad M wrote: > Hello, > > Has anyone used Protek B3 coating for protection against KOH and knows how to effectively REMOVE it after KOH etch? I am doing a process in which I am using 4.5 um of Protek B3 coating to protect my Silicon nitride cantilevers against KOH etch. I would like to know how to REMOVE the B3 coating after the KOH etch? Both dry and wet removal processes would be helpful. > Note: Since my underlying layer is silicon nitride, will using CF4/O2 mixture to remove B3 coating, remove silicon nitride as well? > > Thanks > Ahmad > _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk