What kind of Lithography tool are you using. Can you put in a focus offset to focus at the bottom of the pit? Robert -----Original Message----- From: mems-talk-bounces+r-black1=ti.com@memsnet.org [mailto:mems-talk- bounces+r-black1=ti.com@memsnet.org] On Behalf Of Malar C Sent: Tuesday, May 06, 2014 6:23 AM To: mems-talk@memsnet.org Subject: [mems-talk] Comb Structure Lithography Hi all, I have done etching in Si using RIE to about 260 um. Now I need to pattern comb structure at the bottom of the pit which I couldn’t achieve. I took measures to reduce the roughness using HNA and got reduced roughness less than 100 nm. But comb lithography is still a problem. Is it a problem with roughness or lithography? Can anyone suggest me how to form the comb structure? Malar _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk