Dear Holzer,

I experienced a similar problem with spinning su-8 on Si substrate
with sio2 layer (1.5 micron thick) on the top.  I expect glass to be
somewhat similar.

Dehydration bake appear to be important.  I did 200C degree
dehydration bake for 30-40 mins. That worked better.  Rest of the
conditions were somewhat similar to that reported in different papers.

However, there is never a problem of adhesion on silicon substrate.

good luck

Muralidhar

Dr.Muralidhar K. Ghantasala
Department of  Electrical Engineering
124, La Trobe Street
Melbourne - 3001
Australia

Phone : +61-3-9925 3166
Fax   : +61-3-9925 2007
E-mail : murali@rmit.edu.au