Fool proof technique for that is to pattern alignment mark as a first step using a lift-off and Aluminum. Use you first mask and expose the lit-off resist while masking everything but the alignment marks. Kapton tape on the mask will block UV for this first step, on simply put a silicon wafer cleave the right size. Then with the second layer of SU8, the marks are very well visible. It's an extra step I know, but the time you same not looking for the alignment mark is worth it. Matthieu _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk