Hi Ryan,
   We've a very nice recipe for our Trion ICP/RIE metal etcher.
              CHF3: 47 sccm
               Ar: 3 sccm (yes, argon.)
               Pressure: ~50 mT (though not 100% on this)
               ICP power: 300W
               Platen: 50W
This recipe etched 400nm in 1180 sec.
Cheers,
  Michael
________________________________________
From: mems-talk-bounces+michael.martin=louisville.edu@memsnet.org [mems-talk-
bounces+michael.martin=louisville.edu@memsnet.org] on behalf of Ryan
[ryan@exsior.co.kr]
Sent: Monday, May 19, 2014 1:32 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Best recipe to etch sio2 using CHF3 gas with ULVAC NE-550

Hi.

I am wondering what is the best recipe for etching Sio2 using CHF3 gas with
NE-550 ULVAC?

I do not have any knowledge or data for that.

If possible, could anyone please leave any method with gas and power or
something with care?

Thanks

Ryan

EXCELSIOR
Manager
Ryan Hyunmin Kim
E : ryan@exsior.co.kr
M: +82-10-3802-2229
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk


_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk