Thanks Michael. Otherwise, if source power is lower than bias, does it damage wafer or interrupt uniformity and etch rate? In addition, back side cooling (He) ?? Regards, Ryan EXCELSIOR Manager Ryan Hyunmin Kim E : ryan@exsior.co.kr M: +82-10-3802-2229 _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk