Hi all,

I am using a JEOL 6500 with NPGS for e-Beam lithography. I am having
problems with two main things here.

1) Since I am using the DEBEN PCM Beam Blanker (BB), I am wondering whether
the initial focusing on the gold standard should be done with or without
the BB? Also, does the use of the BB assumed to change the measured beam
current?

2) Since the real sample (substrate) is generally at a different height
than the gold standard, re-focus is needed. Specifically, re adjusting the
Z-height is needed. I have read online that if one is patterning a blank Si
substrate then (s)he need to put a mark on it, e.g. by scratching it, so
that you have something to focus on. My question here is the validity of
this method, since the scratch will probably (by experience) be at a
different height than the the substrate surface, and thus is not a valid
focusing plane.

Thanks in advance for you help. It is assumed that I am using a standard
Si/SiO2 substrate spin coated with PMMA.
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