Dear Yuan
A photoresist mask will survive the etch.
Chrome, sure.

Shay



> On Sep 11, 2015, at 02:29, Yuan Jia  wrote:
>
> Hi All
>
> I have a quick question, I am trying to etch through 300 nm of silicon
> nitride using SF6 dry etch, and I am considering using 50 nm of chrome as
> mask layer, will this mask layer survive the etching?
>
> Or is there a better mask layer material?
>
> Thanks very much
> Best Regrads
>
> --
> Yuan Jia
>
> Mechanical Engineering Department
> Columbia University
> _______________________________________________
> Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> provider of MEMS and Nanotechnology design and fabrication services.
> Visit us at http://www.mems-exchange.org
>
> Want to advertise to this community?  See http://www.memsnet.org
>
> To unsubscribe:
> http://mail.mems-exchange.org/mailman/listinfo/mems-talk
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk