Mehmet,



It sounds like you may be using undiluted HMDS which can react with your
photoresist and render it undevelopable.  We usually dilute our HMDS with
Xylene (80:20 Xylene: HMDS) before the dispense/spin cycle.  A 3000 rpm, 60
second spin cycle with the diluted HMDS should leave a layer that will
improve adhesion without affecting the photoresist that is subsequently
spin-coated.



Best,



Brian Baker

Utah Nanofab





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