Thanks everyone for the valuable comments. I shall take all into account.
2015-10-19 15:13 GMT-04:00 Andrew Sarangan :
> At a high deposition rate, the impingement rate of Cr on the substrate will
> be higher than the impingement rate of background gases. But at 10^-7 Torr
> I still don't think oxidation should be a problem.
> Also, as Michael suggested, Cr is a getter, so you should see the pressure
> drop as the evaporation rate is increased. So run it for a few minutes
> before opening the shutter.
>
>
> On Fri, Oct 16, 2015 at 4:12 PM, Ali Alsaqqa wrote:
>
> > Thanks Andrew. Are you suggesting depositing at a higher rate to reduce
> the
> > total time of deposition and hence time of exposition to oxygen? I would
> > have thought that the higher the rate, the higher the chamber temperature
> > and hence the lower the vacuum level.
> >
> > 2015-10-16 10:55 GMT-04:00 Andrew Sarangan :
> >
> > > The 10^-7 Torr during evaporation is a pretty decent vacuum level, and
> > the
> > > oxidation rate should be very minimal especially if you keep the
> > deposition
> > > rate high.
> > >
> > >
> > >
> > > On Mon, Oct 12, 2015 at 8:44 PM, Ali Alsaqqa
> > wrote:
> > >
> > > > Hello all,
> > > >
> > > > I would like to know what is the best way to prepare films of
> elemental
> > > > Chromium. Exact thickness does not matter, but something like
> hundreds
> > of
> > > > nanometers should be fine. The target measurement is simple transport
> > (I,
> > > > V) in the presence of some magnetic field.
> > > >
> > > > My main concern here is oxidization. I was thinking about depositing
> > the
> > > > films using e-beam evaporator, but it can attain a vacuum of only
> 10-7
> > > > Torr, and with this level oxidization will occur. MBE is not an
> option
> > at
> > > > the moment.
> > > >
> > > > I was also thinking about buying wafers from commercial sectors, but
> I
> > > will
> > > > run into the same problem, i.e. the surface will oxidize as soon as
> it
> > > > contacts air.
> > > >
> > > > Are there any suggestions?
> > > >
> > > > Ali M. Alsaqqa,
> > > > PhD candidate,
> > > > Department of Physics,
> > > > University at Buffalo, NY, USA
> > > > _______________________________________________
> > > > Hosted by the MEMS and Nanotechnology Exchange, the country's leading
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> >
> >
> > --
> > Ali M. Alsaqqa,
> > PhD candidate,
> > Department of Physics,
> > University at Buffalo, NY, USA
> > _______________________________________________
> > Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> > provider of MEMS and Nanotechnology design and fabrication services.
> > Visit us at http://www.mems-exchange.org
> >
> > Want to advertise to this community? See http://www.memsnet.org
> >
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> >
> _______________________________________________
> Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> provider of MEMS and Nanotechnology design and fabrication services.
> Visit us at http://www.mems-exchange.org
>
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--
Ali M. Alsaqqa,
PhD candidate,
Department of Physics,
University at Buffalo, NY, USA
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org
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To unsubscribe:
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