durusmail: mems-talk: Using DAD3220 Dicing Saw without water and air flow
Using DAD3220 Dicing Saw without water and air flow
2016-06-20
Mehmet Yilmaz
Using DAD3220 Dicing Saw without water and air flow
2016-06-20
Ricky Anthony
2016-06-20
Yongliang Yang
2016-06-20
Morrison, Richard H., Jr.
2016-06-20
HORACIO ESTRADA VAZQUEZ
2016-06-21
Mehmet Yilmaz
2016-06-21
basar bolukbas
2016-06-21
Lijun Yan
2016-06-24
patricia jeandel
Using DAD3220 Dicing Saw without water and air flow
Ricky Anthony
2016-06-20
Hi Mehmet,

This seems to be a tricky situation.

I believe  using a easily strippable photoresist (like AZ 9265 which can be
removed in acetone) could protect the structures and can be removed easily after
dicing. Using no air/water flow would result in silicon dust during dicing. The
slower dicing speed would be ideal.

Thanks,
Ricky

-----Original Message-----
From: mems-talk-bounces+ricky.anthony=tyndall.ie@memsnet.org [mailto:mems-talk-
bounces+ricky.anthony=tyndall.ie@memsnet.org] On Behalf Of Mehmet Yilmaz
Sent: 20 June 2016 08:12
To: General MEMS discussion 
Subject: ***SPAM*** [mems-talk] Using DAD3220 Dicing Saw without water and air
flow

Dear mems-talk community,
We have a standard Si wafer that we would like to dice into smaller 1cm x 1cm
square pieces.

The challenge is below:
1. We have very delicate structures on the Si wafer. So, we cannot flow
*strong* air and/or water on Si wafer while dicing. The *strong* flow of
air/wafer damages the delicate structures.* Here, it is very important to
emphasize that, the main contributors to the damage are strong water flow and/or
strong air flow.*

As part of the solution,
We can sacrifice a blade of a dicing saw (~30 USD), and just try to dice the
wafer without water/air flow. However, we are concerned that we may be damaging
more than just the blade of the dicing saw when we do not let air/water flow
during dicing. In case you wonder, the dicing saw is from DISCO, and the type is
DAD3220.

Also,
We may try spinning photoresist on the wafer to protect the delicate structures,
but we are reluctant about spinning photoresist as well, due to some
requirements on the final structures.

Any comments from you who might have had this or similar experience in the past
or currently, would really be appreciated.

Thanks in advance.

Regards,

Mehmet Yilmaz
Mechanical Engineer
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Visit us at http://www.mems-exchange.org

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