Dear MEMS community,
   How much is the residual stress of heavily Boron-doped p+ silicon layer
and epitaxial  singlecrystal layer used for etch-stop. Is there any method
to reduce the stress?



Thanks very much.
Regards
Junhua Zhu
_____________________________________________________

Junhua Zhu
MEME Research Group
Department of Precision Instruments
Tsinghua Univ.
Beijing
P.R. China
100084